论文标题
基于硅上的gan量子点,在300 k处朝着明亮和纯的单个光子发射器朝着
Towards bright and pure single photon emitters at 300 K based on GaN quantum dots on silicon
论文作者
论文摘要
基于III二硝酸半导体的量子点(QD)有望在非晶体温度下由于其大型激子结合能而在非晶体温度下发射。在这里,我们演示了在连续波激发下以$ g^{(2)}(2)}(2)}(0)= 0.17 \ pm 0.08 $在300 K下运行的GAN QD单光子发射器。在此温度下,达到$ g^{(2)}((2)}(0)\ leq 0.5 $时,达到了最高$ 6 \ times10^6 \,\ text {s}^{ - 1} $的单个光子发行率。我们的结果是针对嵌入在硅上生长的平面Aln层中的GAN QD,这代表了将来与光学波导和空腔相互链接的有希望的途径。这些样品允许探索单个光子源(例如亮度和单个光子纯度)的关键性能指标的限制因素。虽然大型激子结合能可以确保高亮度,但单个光子纯度主要受到与比克斯基发射的光谱重叠的影响。因此,GAN QD作为单个光子发射极的性能取决于发射线宽与Biexciton结合能之间的平衡。我们将其发射能超过4.2 eV的小型GAN QD视为未来室温应用的有希望的候选者,因为Biexciton结合能与平均发射线宽相当,约为55 MeV。
Quantum dots (QDs) based on III-nitride semiconductors are promising for single photon emission at non-cryogenic temperatures due to their large exciton binding energies. Here, we demonstrate GaN QD single photon emitters operating at 300 K with $g^{(2)}(0) = 0.17 \pm 0.08$ under continuous wave excitation. At this temperature, single photon emission rates up to $6\times10^6 \, \text{s}^{-1}$ are reached while $g^{(2)}(0) \leq 0.5$ is maintained. Our results are achieved for GaN QDs embedded in a planar AlN layer grown on silicon, representing a promising pathway for future interlinkage with optical waveguides and cavities. These samples allow exploring the limiting factors to key performance metrics for single photon sources, such as brightness and single photon purity. While high brightness is assured by large exciton binding energies, the single photon purity is mainly affected by the spectral overlap with the biexcitonic emission. Thus, the performance of a GaN QD as a single photon emitter depends on the balance between the emission linewidth and the biexciton binding energy. We identify small GaN QDs with an emission energy in excess of 4.2 eV as promising candidates for future room temperature applications, since the biexciton binding energy becomes comparable to the average emission linewidth of around 55 meV.