论文标题
一种多功能和紧凑的高强度电子束，用于在纳米或微电器设备中进行多晶辐射
A versatile and compact high-intensity electron beam for multi-kGy irradiation in nano or micro-electronic devices
论文作者
论文摘要
提出了用于材料老化应用的紧凑型低能和高强度电子源。激光诱导的血浆在30 kV二极管内移动，并在阳极位置产生5 MW的电子束。可以沉积在硅或凝固样品中的相应剂量估计为每次激光射击25 kgy。剂量剖面很大程度上取决于阴极电压，可以从100 nm调整到1 $μ$ m。使用此多功能源，开放的路径可以在没有标准辐射保护问题的情况下在高辐照下研究微型或纳米电子成分。
A compact low-energy and high-intensity electron source for material aging applications is presented. A laser-induced plasma moves inside a 30 kV diode and produces a 5 MW electron beam at the anode location. The corresponding dose that can be deposited into silicon or gallium samples is estimated to be 25 kGy per laser shot. The dose profile strongly depends on the cathode voltage and can be adjusted from 100 nm to 1 $μ$m. With this versatile source, a path is opened to study micro or nano-electronic components under high irradiation, without the standard radioprotection issues.
