论文标题
单层石墨烯FET的低频噪声参数提取方法
Low-frequency noise parameter extraction method for single layer graphene FETs
论文作者
论文摘要
在本文中,提出了一种基于最近建立的紧凑型LFN模型的单层(SL)石墨烯晶体管(GFET)中低频噪声(LFN)的详细参数提取方法。在较低和更高的排水电压下测量了两个短通道后门控GFET(L = 300,100 nm)的漏极电流和LFN,对于覆盖P-TYPE操作区域的远离电荷中性点(CNP)至CNP的范围较大的栅极电压。电流 - 电压(IV)和LFN数据也可从靠近和外观CNP的P型和N型区域的长通道SL顶部溶液门控(SG)GFET(SG)GFET(L = 5 UM)获得。在这些方案中的每一个中,都可以准确提取适当的IV和LFN参数。关于LFN,迁移率波动效应在CNP上是主要的,并且可以从那里提取hooge参数AH,而载体数量波动贡献造成了众所周知的M形偏差依赖于我们数据中的Squal噪声除电流中,也可以观察到与NT参数相关的TRAPS数量。在不太可能的lambda形状趋势的情况下,可以同时从CNP附近的区域同时提取NT和AH。远离CNP,接触电阻可以对LFN产生重要贡献,从那里定义了相关参数SDR^2。上述LFN参数可以从低排水电压区域估算,其中速度饱和(VS)机制的影响可以忽略不计。 VS效应会导致在较高的排水电压下的LFN降低,从那里iv参数homega代表声子能量,并且与VS效应有关,可以从漏极电流和LFN数据中得出。
In this paper, a detailed parameter extraction methodology is proposed for low-frequency noise (LFN) in single layer (SL) graphene transistors (GFETs) based on a recently established compact LFN model. Drain current and LFN of two short channel back-gated GFETs (L=300, 100 nm) were measured at lower and higher drain voltages, for a wide range of gate voltages covering the region away from charge neutrality point (CNP) up to CNP at p-type operation region. Current-voltage (IV) and LFN data were also available from a long channel SL top solution-gated (SG) GFET (L=5 um), for both p- and n-type regions near and away CNP. At each of these regimes, the appropriate IV and LFN parameters can be accurately extracted. Regarding LFN, mobility fluctuation effect is dominant at CNP and from there the Hooge parameter aH can be extracted while the carrier number fluctuation contribution which is responsible for the well-known M-shape bias dependence of output noise divided by squared drain current, also observed in our data, makes possible the extraction of the NT parameter related to the number of traps. In the less possible case of a Lambda-shape trend, NT and aH can be extracted simultaneously from the region near CNP. Away from CNP, contact resistance can have a significant contribution to LFN and from there the relevant parameter SDR^2 is defined. The LFN parameters described above can be estimated from the low drain voltage region of operation where the effect of Velocity Saturation (VS) mechanism is negligible. VS effect results in the reduction of LFN at higher drain voltages and from there the IV parameter hOmega which represents the phonon energy and is related to VS effect can be derived both from drain current and LFN data.