论文标题
残留的碳杂质和耐甘露的影响对Algan/gan mists的捕获效果的影响
Impact of Residual Carbon Impurities and Gallium Vacancies on Trapping Effects in AlGaN/GaN MIS-HEMTs
论文作者
论文摘要
残留C杂质和GA空位对Aln/Algan/Gan金属绝缘子半导体高电子迁移式晶体管的动态不稳定性的影响。次级离子质谱,正电子歼灭光谱,稳态和时间分辨光致发光(PL)测量已与电特性和电流瞬态分析一起进行。研究了黄色发光(YL),C-和GA空位浓度之间的相关性。时间分辨的PL表示C $ _ {\ Mathrm {n}} $ o $ _ {\ Mathrm {n}} $复合物作为YL的主要来源,而GA空位或与C相关的复合物似乎并不扮演主要角色。发现设备动态性能显着取决于靠近晶体管通道的C浓度。此外,发现YL的大小与阈值电压移动和抗性降解一致。 GAN缓冲液的陷阱分析显示,所有样品的明显激活能为$ \ sim $ 0.8EV,指向一个常见的主导陷阱过程,并且生长参数仅影响陷阱中心的密度。可以推断,捕获过程可能与基于C的缺陷直接相关。
Effects of residual C impurities and Ga vacancies on the dynamic instabilities of AlN/AlGaN/GaN metal insulator semiconductor high electron mobility transistors are investigated. Secondary ion mass spectroscopy, positron annihilation spectroscopy, steady state and time-resolved photoluminescence (PL) measurements have been performed in conjunction with electrical characterization and current transient analyses. The correlation between yellow luminescence (YL), C- and Ga vacancy concentration is investigated. Time-resolved PL indicating the C$_{\mathrm{N}}$O$_{\mathrm{N}}$ complex as the main source of the YL, while Ga vacancies or related complexes with C seem not to play a major role. The device dynamic performance is found to be significantly dependent on the C concentration close to the channel of the transistor. Additionally, the magnitude of the YL is found to be in agreement with the threshold voltage shift and with the on-resistance degradation. Trap analysis of the GaN buffer shows an apparent activation energy of $\sim$0.8eV for all samples, pointing to a common dominating trapping process and that the growth parameters affect solely the density of trap centres. It is inferred that the trapping process is likely to be directly related to C based defects.