论文标题
X射线相对比地形，以测量硅晶体中的表面应力和大量应变
X-ray phase contrast topography to measure the surface stress and bulk strain in a silicon crystal
论文作者
论文摘要
通过X射线干涉法测量SI晶格参数是假设使用无应变晶体，由于表面松弛，重建和氧化而导致的固有应力可能并非如此。我们使用X射线相位对比的地形来研究干涉仪晶体对精加工，退火和涂层的应变敏感性。我们通过测量由于沉积在干涉仪镜面上的铜膜而测量的晶格菌株来评估地形能力。副产品是在完全松弛涂料后测量表面应力的。
The measurement of the Si lattice parameter by x-ray interferometry assumes the use of strain-free crystals, which might not be true because of intrinsic stresses due to surface relaxation, reconstruction, and oxidation. We used x-ray phase-contrast topography to investigate the strain sensitivity to the finishing, annealing, and coating of the interferometer crystals.We assessed the topography capabilities by measuring the lattice strain due to films of copper deposited on the interferometer mirror-crystal. A byproduct has been the measurement of the surface stresses after complete relaxation of the coatings.
