论文标题

TI6AL4V和NICR植入合金的电流相互作用下的摩托腐蚀

Tribocorrosion under galvanic interaction of Ti6Al4V and NiCr implant alloys

论文作者

Barros, Camila Dias dos Reis, Rocha, Janaina Cardozo, Bastos, Ivan Napoleão, Gomes, José Antônio da Cunha Ponciano

论文摘要

在牙科假体和植入物之间发生的关节中发生的小动物会导致磨损引起的降解。可以通过含有氟化物的溶液影响的口腔环境中的腐蚀来增强此过程。此外,NICR和Ti合金之间最终的电阵相互作用可以加速磨损过程。在这项工作中,研究了浸入不同pH值的牙齿植入物康复中的Ti6Al4v和NICR合金的摩擦腐蚀过程。还评估了合金之间的电流相互作用效应。用分离的Ti6Al4V和NICR合金进行腐蚀性培养基中的互动测试,然后与两种合金接触进行测试。选择的介质基于在口服环境中可能发现的氟化物浓度和pH值。使用共聚焦激光显微镜进行摩擦腐蚀测试后的表面分析。通过共聚焦测量确定磨损曲线和体积损失。结论是,与分离的TI6AL4V合金相比,合金之间的电阵相互作用增加了Ti6Al4V的抗抗腐蚀性。 TI6AL4V与NICR相结合,可以减少滑动过程中的电化学势衰减。 Ti6Al4V电位从主动溶解到被动结构域的电化学转移来解释了抗药性。

Micromovements that occur in the joint between dental prostheses and implants can lead to wear-induced degradation. This process can be enhanced by corrosion in the oral environment influenced by the presence of solutions containing fluoride. Moreover, the eventual galvanic interactions between NiCr and Ti alloys can accelerate the wear-corrosion process. In this work, the tribocorrosion process of Ti6Al4V and NiCr alloys used in dental implant rehabilitations immersed in fluoride solutions at different pH values was investigated. The galvanic interaction effect between the alloys was also assessed. Tribocorrosion tests in corrosive media were performed with isolated Ti6Al4V and NiCr alloys, followed by testing with both alloys in contact. The media selected were based on fluoride concentrations and pH values that are possible to be found in oral environments. Analysis of the surfaces after the tribocorrosion tests was carried out using confocal laser microscopy. The wear profile and volume losses were determined by confocal measurements. It was concluded that the galvanic interaction between the alloys increased the tribocorrosion resistance of Ti6Al4V, compared with that of the isolated Ti6Al4V alloy. Ti6Al4V coupled with NiCr reduced the electrochemical potential decay during sliding. The increased resistance was explained by the electrochemical shift of the Ti6Al4V potential from active dissolution to the passive domain.

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