论文标题
对在纳米片衍生的泰坦尼亚薄膜中进行灯丝形成的耐受性
Tolerance against conducting filament formation in nanosheet-derived titania thin films
论文作者
论文摘要
在此，二氧化钛薄膜是通过易于液态相的方法来制造的，该方法基于真空过滤二氧化钛纳米片的胶体悬浮液的真空过滤，然后进行热退火以将纳米片膜转化为ranatase tio2。纳米片衍生的钛薄膜具有界面类型机制的电阻性开关不良。这种行为与其他常规技术制造的钛薄膜观察到的丝状开关不同。对传导丝形成的这种耐受性可以归因于纳米片衍生的膜中低浓度的氧空位，这是由于钛含量（TI0.87O2）纳米片的O/Ti比大于TiO2大的含量。此外，发现纳米片衍生的膜的介电击穿强度与其他技术制造的二氧化钛薄膜相当或更高。这些发现清楚地表明了纳米片衍生的钛薄膜对介电应用的有用性。
Herein, titania thin films are fabricated by a facile liquid-phase method based on vacuum filtration of a colloidal suspension of titania nanosheets, which is followed by thermal annealing to transform the nanosheet film into anatase TiO2. Nanosheet-derived titania thin films exhibit poor resistive switching with an interface-type mechanism. This behaviour is distinct from the filamentary switching that has been observed with titania thin films fabricated by other conventional techniques. This tolerance against conducting-filament formation may be ascribed to a low concentration of oxygen vacancies in nanosheet-derived films, which is expected because of the O/Ti ratio of titania (Ti0.87O2) nanosheets being larger than that of TiO2. Besides, the dielectric breakdown strength of nanosheet-derived films is found to be comparable to or higher than that of titania thin films fabricated by other techniques. These findings clearly indicate the usefulness of nanosheet-derived titania thin films for dielectric applications.
