论文标题
LA2/3SR1/3MNO3（001）上的铁电HF0.5ZR0.5O2（111）的域匹配外延
Domain Matching Epitaxy of Ferroelectric Hf0.5Zr0.5O2(111) on La2/3Sr1/3MnO3(001)
论文作者
论文摘要
外延铁电HFO2膜最适合研究材料的内在特性和原型化的新兴设备。铁电HF0.5ZR0.5O2（111）膜已在LA2/3SR1/3MNO3（001）电极上外上稳定。考虑到对称性的差异和巨大的晶格不匹配，这种外延与外交的常规机制不兼容。为了深入了解外延机制，进行了界面的扫描透射电子显微镜表征，从而揭示了较短周期性的一系列位错阵列。这些观察到的周期性与对域匹配外延的预期一致，这表明这种非常规机制可能是铁电HF0.5ZR0.5O2稳定的主要因素，其在（111）等于（111）的同际HF0.5ZR0.5ZR0.5ZR0.5ZR0.5O2（111）（111）/la2/la2/la2/3sr1/3mnos heros heros heros。
Epitaxial ferroelectric HfO2 films are the most suitable to investigate intrinsic properties of the material and for prototyping emerging devices. Ferroelectric Hf0.5Zr0.5O2(111) films have been epitaxially stabilized on La2/3Sr1/3MnO3(001) electrodes. This epitaxy, considering the symmetry dissimilarity and the huge lattice mismatch, is not compatible with conventional mechanisms of epitaxy. To gain insight into the epitaxy mechanism, scanning transmission electron microscopy characterization of the interface was performed, revealing arrays of dislocations with short periodicities. These observed periodicities agree with the expected for domain matching epitaxy, indicating that this unconventional mechanism could be the prevailing factor in the stabilization of ferroelectric Hf0.5Zr0.5O2 with (111) orientation in the epitaxial Hf0.5Zr0.5O2(111)/La2/3Sr1/3MnO3(001) heterostructure.
