论文标题

2D MOS2半导体的电化学表面修饰

Electrochemical Surface Modification of a 2D MoS2 Semiconductor

论文作者

Lihter, Martina, Graf, Michael, Iveković, Damir, Shen, Tzu-Hsien, Zhao, Yanfei, Tileli, Vasiliki, Radenovic, Aleksandra

论文摘要

2D半导体材料的表面修饰,例如过渡金属二核苷(TMDC),对于多种应用,例如生物传感,催化,能量产生和能量存储变得重要。由于其基础平面的化学惰性,2D TMDC的表面修饰主要限于其缺陷位点,或者需要从半导体转换为金属相的TMDC转换。在这项工作中,我们表明,可以通过对芳基 - 二氮二氮盐的电化学移植(例如3,5-双(三氟甲基)苯基苯基苯基二氮二氮二氮二氮二氮二氮二氮化盐酸酯剂的电化学移植来修饰2D半导体钼(MOS2)的基础平面。为了调查此方法的适用性,我们通过通过不同的电极分别解决MOS2纳米纤维对它们进行电气处理。该方法在纳米级上的高空间选择性为相邻2D层和电极接触的纳米结构的特定表面修饰的可能性打开了。该方法可能适用于其他2D半导体材料,这些材料在相同的潜在窗口中活跃,在相同的潜在窗口中,在芳基重氮盐的电化学还原。

The surface modification of 2D semiconducting materials, such as transition metal dichalcogenides (TMDCs), is becoming important for a diverse range of applications, such as biosensing, catalysis, energy generation and energy storage. Due to the chemical inertness of their basal plane, the surface modification of 2D TMDCs is mainly limited to their defective sites, or it requires a conversion of TMDC from its semiconducting into a metallic phase. In this work, we show that the basal plane of a 2D semiconductor molybdenum disulfide (MoS2) can be modified by electrochemical grafting of aryl-diazonium salt, such as 3,5-bis(trifluoromethyl)benzenediazonium tetrafluoroborate. To investigate the applicability of this method, we perform electrografting on MoS2 nanoribbons by addressing them individually via a different electrode. High spatial selectivity of this method on the nanoscale opens the possibility for specific surface modification of neighboring 2D layers and nanostructures that are contacted by electrodes. This method could be potentially applicable to other 2D semiconducting materials that are active in the same potential window in which the electrochemical reduction of aryl diazonium salts occurs.

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