论文标题
外延瘙痒性拓扑剂拓扑绝缘膜中多个X射线散射的混合反射
Hybrid reflections from multiple x-ray scattering in epitaxial bismuth telluride topological insulator films
论文作者
论文摘要
由于潜在的旋转和量子计算中的潜在应用，肽尿素拓扑绝缘子的外延膜已受到越来越多的关注。外延膜最重要的特性之一是由于横向晶格不匹配而导致的界面缺陷，因为电活动缺陷可以极大地损害设备的性能。通过描述六角形二尿酸酯膜上的混合反射在立方底物上，面板内晶格不匹配的特征至少要比使用其他X射线衍射方法高20倍，从而提供了0.007 \％的侧面晶格不匹配的明确证据，与van deraals结构相关的压力松弛一致。
Epitaxial films of bismuth telluride topological insulators have received increasing attention due to potential applications in spintronic and quantum computation. One of the most important properties of epitaxial films is the presence of interface defects due to lateral lattice mismatch since electrically active defects can drastically compromise device performance. By describing hybrid reflections in hexagonal bismuth telluride films on cubic substrates, in-plane lattice mismatches were characterized with accuracy at least 20 times better than using other X-ray diffraction methods, providing clear evidence of 0.007\% lateral lattice mismatch, consistent with stress relaxation associated with van der Waals gaps in the film structure.
