论文标题
原子精度处理高性能计算和人工智能中的边界微电子应用的新材料
Atomic Precision Processing of New Materials for Frontier Microelectronic Applications in High Performance Computing and Artificial Intelligence
论文作者
论文摘要
该文档是普林斯顿血浆物理实验室的科学家IBM T. J. Watson Research Center and Applied Materials，Inc。对DOE科学办公室（DOE-SC）的共同回应：微电子学基础研究计划： （https://www.federalregister.gov/documents/2019/07/12/12/2019-14869/request-for-information-basic-information-basic-research-initiatip-initiative-for-for-microelectronics）。具体而言，我们建议DOE-SC在其考虑中包括以下主题，以便将来对微电源征集：1）开发实时监控和原位诊断技术，这些技术可以提供有关血浆，底物表面的信息，以及在最先进的微型机构中的高级材料中，以及两者之间的相互作用以及两者之间的相互作用，以实现高级机器人的应用程序，以实现高级机器的应用程序，以实现高级机器的应用程序，以实现高度的高度性能计算。经过实验验证的建模工具，可预测处理动态，包括等离子体，化学和材料过程。
This document is a joint response by scientists from the Princeton Plasma Physics Laboratory, IBM T. J. Watson Research Center and Applied Materials, Inc. to the DOE Office of Science (DOE-SC) Request for Information: Basic Research Initiative for Microelectronics (https://www.federalregister.gov/documents/2019/07/12/2019-14869/request-for-information-basic-research-initiative-for-microelectronics). Specifically, we propose DOE-SC to include the following topics in their consideration for future solicitations on Microelectronics: 1) The development of a real-time monitoring and in-situ diagnostic techniques that can provide information on plasma, substrate surface, and interaction between both during atomic precision processing of complex materials for the most advanced microelectronic devices with applications to high performance computing and artificial intelligence, and 2) The development of experimentally validated modeling tools to predict processing dynamics including plasma, chemical and material processes involved.
