论文标题
高能电子中高能电子的K壳电离和特征X射线辐射
K-shell ionization and characteristic x-ray radiation by high-energy electrons in multifoil targets
论文作者
论文摘要
考虑到通过多要铜靶的高能电子通过高能电子进行的K壳电离和随附的特征X射线辐射（CXR）的过程。描述这些过程的主要特征的表达式是得出的。结果表明，目标中的平均k壳电离横截面不仅是由目标材料和电子能量定义的，还取决于目标中的箔层的数量，它们之间的厚度和分离。因此，相应的CXR产率不是由汇总目标厚度明确定义的，而是取决于上述参数。已经证明，多要目标中的平均K壳电离横截面可能比该过程的常规横截面大几倍，而没有密度影响。与单个相同聚合厚度的单个箔相比，这导致了多要目标的CXR产量可显着提高CXR产量。在被考虑的情况下，CXR产量与多效目标中其他某些其他类型的X射线发射的产量进行比较。
Processes of K-shell ionization and accompanying characteristic x-ray radiation (CXR) by high-energy electrons moving through a multifoil copper target are considered. Expressions describing the main characteristics of these processes are derived. It is shown that the average K-shell ionization cross section in the target is not defined just by the target material and the electron energy, but also depends on the number of foils in the target, their thickness and separation between them. The corresponding CXR yield is therefore not unambiguously defined by the aggregated target thickness, but depends on the above parameters as well. It is demonstrated that the average K-shell ionization cross section in a multifoil target can be several times larger than the conventional cross section of this process without the density effect impact. This results in a considerable enhancement of CXR yield from the multifoil target compared to the case of electron incidence upon a single foil of the same aggregated thickness. Comparison of CXR yield in the considered case with the yields of some other types of x-ray emission in multifoil targets is made.
