论文标题

超薄抗铁磁金属氮化物中的应变介导的高电导率

Strain-mediated high conductivity in ultrathin antiferromagnetic metallic nitrides

论文作者

Jin, Qiao, Cheng, Hu, Wang, Zhiwen, Zhang, Qinghua, Lin, Shan, Roldan, Manuel A., Zhao, Jiali, Wang, Jia-Ou, Chen, Shuang, He, Meng, Ge, Chen, Wang, Can, Lu, Hui-Bin, Guo, Haizhong, Gu, Lin, Tong, Xin, Zhu, Tao, Wang, Shanmin, Yang, Hongxin, Jin, Kui-juan, Guo, Er-Jia

论文摘要

应变工程提供了控制地面状态和外延膜中相关相变的能力。然而,由于难以制造化学计量和高质量的膜,对内在特征的系统研究及其在过渡金属氮化物中的应变依赖性仍然具有挑战性。在这里,我们报告了具有应变和降低性降低的高度结晶抗铁磁CRN膜中电子状态转变的观察。在CRN膜中观察到膜厚度缩小膜厚度至〜30个单位细胞的临界值约为30个单位细胞,并伴随着意外体积的膨胀。当CRN层与单个单位细胞厚的CRN层薄(远低于大多数金属膜的临界厚度)时,会出人意料地观察到电导率。我们发现,超薄CRN膜的金属性是通过制造有史以来首次独立的氮化物膜去除生长菌株后从绝缘行为中恢复的。第一原理的计算和线性二色性测量表明,应变介导的轨道分裂有效地定制了在费米水平上相对较小的带隙,从而导致CRN中的外来相变。通过在竞争阶段利用应变控制来实现高导电氮化物超薄膜的能力可用于利用其特征。

Strain engineering provides the ability to control the ground states and associated phase transition in the epitaxial films. However, the systematic study of intrinsic characters and their strain dependency in transition-metal nitrides remains challenging due to the difficulty in fabricating the stoichiometric and high-quality films. Here we report the observation of electronic state transition in highly crystalline antiferromagnetic CrN films with strain and reduced dimensionality. Shrinking the film thickness to a critical value of ~ 30 unit cells, a profound conductivity reduction accompanied by unexpected volume expansion is observed in CrN films. The electrical conductivity is observed surprisingly when the CrN layer as thin as single unit cell thick, which is far below the critical thickness of most metallic films. We found that the metallicity of an ultrathin CrN film recovers from an insulating behavior upon the removal of as-grown strain by fabrication of first-ever freestanding nitride films. Both first-principles calculations and linear dichroism measurements reveal that the strain-mediated orbital splitting effectively customizes the relatively small bandgap at the Fermi level, leading to exotic phase transition in CrN. The ability to achieve highly conductive nitride ultrathin films by harness strain-controlling over competing phases can be used for utilizing their exceptional characteristics.

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