论文标题
六角形氮化硼在金属和碳纳米管底物上的六角硼的合成和表征
Application-Driven Synthesis and Characterization of Hexagonal Boron Nitride on Metal and Carbon Nanotube Substrates
论文作者
论文摘要
六边形硝化硼(H-BN)在二维材料中是独一无二的,具有较大的带隙(〜6 eV)和较高的导热率(> 400 W/m/k),仅次于电绝缘体中的钻石。迄今为止,大多数电子研究都依赖于从散装晶体中剥落的H-BN。但是,对于可扩展的应用,必须通过诸如化学蒸气沉积(CVD)等方法合成材料。在这里,我们证明了由CVD在单晶铂和碳纳米管(CNT)底物上合成的单层和几层H-BN,也将这些膜与沉积在更常用的多晶PT和Cu生长底物上的H-BN进行比较。在单晶PT上生长的H-BN膜具有较低的表面粗糙度,并且在空间上比来自多晶PT箔的膜更为均匀,并且我们的电化学转移过程允许将这些昂贵的箔被重复使用而无需可测量的降解。此外,我们证明了单层H-BN作为超薄,3.33 $ \ unicode {x212b} $屏障保护MOS2在高温下的损害,并讨论了其他利用保形H-BN沉积在这项工作中所证明的各种底物的应用。
Hexagonal boron nitride (h-BN) is unique among two-dimensional materials, with a large band gap (~6 eV) and high thermal conductivity (>400 W/m/K), second only to diamond among electrical insulators. Most electronic studies to date have relied on h-BN exfoliated from bulk crystals; however, for scalable applications the material must be synthesized by methods such as chemical vapor deposition (CVD). Here, we demonstrate single- and few-layer h-BN synthesized by CVD on single crystal platinum and on carbon nanotube (CNT) substrates, also comparing these films with h-BN deposited on the more commonly used polycrystalline Pt and Cu growth substrates. The h-BN film grown on single crystal Pt has a lower surface roughness and is more spatially homogeneous than the film from a polycrystalline Pt foil, and our electrochemical transfer process allows for these expensive foils to be reused with no measurable degradation. In addition, we demonstrate monolayer h-BN as an ultrathin, 3.33 $\unicode{x212B}$ barrier protecting MoS2 from damage at high temperatures and discuss other applications that take advantage of the conformal h-BN deposition on various substrates demonstrated in this work.