论文标题

调整增益层掺杂浓度和碳植入对深增益层的影响

Tuning of gain layer doping concentration and Carbon implantation effect on deep gain layer

论文作者

Mazza, S. M., Gee, C., Zhao, Y., Padilla, R., Ryan, E., Tournebise, N., Darby, B., McKinney-Martinez, F., Sadrozinski, H. F. -W., Seiden, A., Schumm, B., Cindro, V., Kramberger, G., Mandić, I., Mikuž, M., Zavrtanik, M., Arcidiacono, R., Cartiglia, N., Ferrero, M., Mandurrino, M., Sola, V., Staiano, A., Boscardin, M., Della Betta, G. F., Ficorella, F., Pancheri, L., Paternoster, G.

论文摘要

下一代低增益雪崩二极管(LGAD)由Hamamatsu Photonics(HPK)和Fondazione Bruno Kessler(FBK)在卢布尔雅那(Ljubljana)的JSI设施中用〜1MEV中子进行照射之前和之后测试了ljubljana的〜1MEV中子之前和之后测试。传感器被照射至2.5E15 NEQ/CM2的最大1毫秒等效通量。本文中分析的传感器是从先前的FBK和HPK Productions中学到的经验教训后的改进,这些传感器已经在先例论文中报告了。对HPK传感器的增益层进行了微调,以优化辐照前后的性能。 FBK传感器相反,结合了碳输液和深层增益层的益处,以进一步促进传感器的辐射硬度并降低散装厚度以增强定时分辨率。使用\ b {eta} - 粒子从90SR源和电容 - 电压扫描(C-V)中测量传感器性能,以确定耗尽增益层的偏差。收集的电荷和正时分辨率是在-30c处测量的偏置电压的函数。最后,在耗尽增益层的偏置电压和达到传感器中一定量增益所需的偏置电压之间显示了相关性。 HPK传感器在辐照前显示出更好的性能,同时保持了先前产量的辐射硬度。 FBK传感器显示出非凡的辐射硬度,可在最大通量时收集的电荷最多10 fc和40 ps的时间分辨率。

Next generation Low Gain Avalanche Diodes (LGAD) produced by Hamamatsu photonics (HPK) and Fondazione Bruno Kessler (FBK) were tested before and after irradiation with ~1MeV neutrons at the JSI facility in Ljubljana. Sensors were irradiated to a maximum 1-MeV equivalent fluence of 2.5E15 Neq/cm2. The sensors analysed in this paper are an improvement after the lessons learned from previous FBK and HPK productions that were already reported in precedent papers. The gain layer of HPK sensors was fine-tuned to optimize the performance before and after irradiation. FBK sensors instead combined the benefit of Carbon infusion and deep gain layer to further the radiation hardness of the sensors and reduced the bulk thickness to enhance the timing resolution. The sensor performance was measured in charge collection studies using \b{eta}-particles from a 90Sr source and in capacitance-voltage scans (C-V) to determine the bias to deplete the gain layer. The collected charge and the timing resolution were measured as a function of bias voltage at -30C. Finally a correlation is shown between the bias voltage to deplete the gain layer and the bias voltage needed to reach a certain amount of gain in the sensor. HPK sensors showed a better performance before irradiation while maintaining the radiation hardness of the previous production. FBK sensors showed exceptional radiation hardness allowing a collected charge up to 10 fC and a time resolution of 40 ps at the maximum fluence.

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