论文标题
扫描探针悬臂的纳米结构的电子梁光刻
Electron-beam lithography of nanostructures at the tips of scanning probe cantilevers
论文作者
论文摘要
我们开发了一个工艺，以在扫描探针悬臂上制造纳米级金属栅极电极，包括在突出的悬臂尖端的不规则表面上。该过程包括一种浮动技术，可在电子梁抗体中覆盖悬臂。我们通过升降过程以及通过蚀刻过程来证明门的定义。悬臂在进行图案过程后保持高力敏感性。我们的方法允许在脆弱的扫描探针上对纳米级设备进行图案，从而扩展其作为传感器的功能。
We developed a process to fabricate nanoscale metallic gate electrodes on scanning probe cantilevers, including on the irregular surface of protruding cantilever tips. The process includes a floating-layer technique to coat the cantilevers in electron-beam resist. We demonstrate gate definition through a lift-off process, as well as through an etching process. The cantilevers maintain a high force sensitivity after undergoing the patterning process. Our method allows the patterning of nanoscale devices on fragile scanning probes, extending their functionality as sensors.
